METROLOGICAL APPARATUS AND A METHOD OF DETERMINING A SURFACE CHARACTERISTIC OR CHARACTERISTICS
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 21, 2015
app pub date -
Jul 19, 2013
filing date -
Jul 19, 2012
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A metrological apparatus includes an optical measurement system (1) such as a coherence scanning interferometer operable to obtain measurement data representative of a surface of a workpiece and a rotation device (15) to effect relative rotation between the optical measurement system and the workpiece about a measurement axis to enable a plurality of measurement data sets to be obtained with each measurement data set being obtained by the optical measurement system at a respective one of a number of different relative rotational orientation s of the optical measurement system and the workpiece. A data corrector (323) is provided to obtain correction data to enable correction of a measurement data set. The correction data may be an average of the plurality of measurement data sets.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully