Assembly For Modifying Properties Of A Plurality Of Radiation Beams, A Lithography Apparatus, A Method Of Modifying Properties Of A Plurality Of Radiation Beams And A Device Manufacturing Method
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United States of America Patent
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app pub date -
May 6, 2013
filing date -
Jun 1, 2012
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Abandoned
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Abstract
An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.
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