SULFUR AND SELENIUM PASSIVATION OF SEMICONDUCTORS
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United States of America Patent
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Issued Date -
Apr 30, 2015
app pub date -
Oct 27, 2014
filing date -
Oct 25, 2013
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Abandoned
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Abstract
The present invention includes methods directed to improved processes for producing a monolayer of sulfur or selenium on the surface of a semiconductor. As a surface layer, it functions to passivate the surface; if annealed, it provides a doping element.
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