TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20150107771A1
SERIAL NO

14518079

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A trap apparatus includes: a first cylindrical member including a space; a second cylindrical member removably disposed in the space and including side opening which allows a gas stream to flow in therethrough, and a downstream side opening which allows the gas stream flowing in from the upstream side opening to flow out therethrough; a downstream side trap member which is disposed inside the second cylindrical member to block the downstream side opening; and an upstream side trap member which is disposed between the downstream side trap member and the upstream side opening of the second cylindrical member and includes a concave portion recessed in a direction approaching the downstream side trap member.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325
TOHOKU SEIMITSU CO LTD22-83-13 MURASAKINO KITAKAMI-SHI IWATE 024-0004

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AKIYAMA, Shinji Miyagi, JP 4 64
ANDOU, Shuuichi Iwate, JP 1 4
KOBAYASHI, Atsushi Miyagi, JP 449 5864
KOSUGA, Katsuhiro Iwate, JP 2 5
YAMAMOTO, Takahiro Iwate, JP 297 1896

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