BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD THEREOF
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United States of America Patent
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Issued Date -
Apr 16, 2015
app pub date -
Oct 11, 2013
filing date -
Oct 11, 2013
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Abandoned
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Abstract
A barrier chemical mechanical planarization polishing composition is provided that includes the suitable chemical additives. The suitable chemical additives are organic polymer molecules containing ethylene oxide repeating units having the general molecular structure of
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