Device for the homogeneous wet-chemical treatment of substrates
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United States of America Patent
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Dec 29, 2015
Grant Date -
Apr 16, 2015
app pub date -
Oct 14, 2014
filing date -
Oct 15, 2013
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Abstract
A device for wet-chemical treatment of substrates includes: an accommodation device for a substrate and a process medium, the substrate having a treatment side in operative connection with the process medium; a fluid guidance element, having a specified surface texture, housed in the accommodation device, the specified surface texture being configured to provide a guidance of the process medium along the specified surface texture, the specified surface texture being positioned lying opposite and at a predetermined fixed recess at a distance from the treatment side of the substrate; and the process medium being moved in the intervening space between the specified surface texture of the fluid guidance element and the treatment side of the substrate.
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