IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Apr 9, 2015
app pub date -
Aug 8, 2014
filing date -
Aug 8, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention provides an image sensor including an oxide semiconductor layer formed on a gate electrode, an oxide film formed on a surface of a channel region of the oxide semiconductor layer, source and drain electrodes formed on the oxide semiconductor layer and spaced apart from each other with the channel region interposed therebetween, an anti-etching film formed on the source and drain electrodes and configured to cover the oxide film, and a photodiode connected to the drain electrode.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully