EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
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United States of America Patent
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app pub date -
Nov 28, 2014
filing date -
May 29, 2012
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Abandoned
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Abstract
An extreme ultraviolet light generation device may be configured to generate extreme ultraviolet light by irradiating a target with a laser beam to turn the target into plasma. The extreme ultraviolet light generation device may comprise: a chamber provided with at least one through-hole; an optical system configured to introduce the laser beam into a predetermined region in the chamber through the at least one through-hole; and a target supply device configured to supply a powder target as the target to the predetermined region.
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