PROCESS FOR PRODUCING THICK NANOSTRUCTURED FILMS OBTAINED FROM A BLOCK COPOLYMER COMPOSITION
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United States of America Patent
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Issued Date -
Mar 12, 2015
app pub date -
Sep 9, 2014
filing date -
Sep 9, 2013
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Abstract
The present invention relates to a process for producing nanostructured films obtained from block copolymers exhibiting a dispersity index of between 1.1 and 2, limits included, without nanostructuring defects, on a surface, in order for this treated surface to be able to be used as masks for applications in microelectronics.
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