CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
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United States of America Patent
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Issued Date -
Mar 12, 2015
app pub date -
Sep 3, 2014
filing date -
Sep 11, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a pattern definition device for a charged-particle multi-beam processing or inspection apparatus comprises a deflection array device with an aperture array field for blanking a plurality of beamlets. The deflection array device comprises a plurality of deflection devices, each associated with a respective opening and comprising at least one electrostatic electrode for deflecting, when activated, the beamlet traversing the opening off its nominal path. However, one or more deflection devices may be defective, permanently unable to deflect their respective beamlets. To correct these “non-deflected beamlets” the pattern definition device comprises a filtering device having openings allowing passage of beamlets where the respective deflection devices are operative, and at least one obstructing device which is programmable to permanently assume an obstructing state where it prevents the respective non-deflected beamlets from traversing the pattern definition device along their respective nominal paths downstream of the pattern definition device.
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