New Lithographic Method

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United States of America Patent

SERIAL NO

14478620

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Abstract

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A method for removing a high definition nanostructure in a partly free-standing layer, the layer, a sensor comprising said layer, a use of said sensor, and a method of detecting a species, and optional further characteristics thereof, using said sensor. The sensor and method are suited for detecting single ions, molecules, low concentrations thereof, and identifying sequences of base pairs, e.g., in a DNA-strand.

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Patent Owner(s)

Patent OwnerAddress
TECHNISCHE UNIVERSITEIT DELFTSTEVINWEG 1 DELFT 2628 CN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dekker, Cornelis Delft, NL 8 30
Schneider, Gregory Delft, NL 3 33
Song, Bo Delft, NL 98 492
Wu, Mengyue Delft, NL 1 0
Xu, Qiang Delft, NL 173 891
Zandbergen, Henny Delft, NL 1 0

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