Phase Contrast Imaging Using Patterned Illumination/Detector and Phase Mask
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United States of America Patent
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Issued Date -
Feb 26, 2015
app pub date -
Aug 21, 2014
filing date -
Aug 23, 2013
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Abstract
A modified phase shifting mask is used to improve performance over traditional Zernike phase contrast imaging. The configurations can lead to an improved imaging methodology potentially with reduced artifacts and more than one order of magnitude gain in photon efficiency, in some examples. Moreover, it can be used to yield a direct representation of the sample's phase contrast information without the need for additional specialized post-acquisition image analysis. The approach can be applied to both wide-field and scanning configurations by using a phase mask including a pattern of phase elements and an illumination mask, having a pattern of holes, for example, that corresponds to a pattern of the phase mask.
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