Method for manufacturing holographic bi-blazed grating
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United States of America Patent
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Jul 7, 2015
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Feb 19, 2015
app pub date -
Oct 10, 2012
filing date -
Oct 19, 2011
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Abstract
A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating (12) and a homogeneous grating (14) as masks, thereby implementing different controls on the two blaze angles, and avoiding a secondary photoresist lithography process. Because when manufacturing the homogeneous grating (14), the time of positive ion beam etching can be controlled, so that the groove depth of the homogeneous grating (14) is controlled accurately. In addition, because the homogeneous grating mask and a substrate (10) are made of the same material, etching rates of the two are consistent, so that the accurate control of blaze angles can be implemented.
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