Scanned 1-D Gas Plume Profile and Flux Measurements Using Multiple Analysis Instruments

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United States of America Patent

SERIAL NO

14532999

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Abstract

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A gas concentration image (i.e., concentration vs. position data) in a cross section through a gas plume is obtained. Such measurements can be obtained by moving a 1D array of gas sample inlets through the gas plume. By combining a gas concentration image with ambient flow information through the surface of the gas concentration image, the leak rate (i.e., gas flux) from the leak source can be estimated. Multiple gas analysis instruments can be employed in connection with sweeping a 1-D array of measurement ports through the gas plume in order to reduce analysis time.

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SILICON VALLEY BANK3003 TASMAN DRIVE HG 150 SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Crosson, Eric R Livermore, US 19 169
Fischer, Marc L Berkeley, US 2 4
Rella, Chris W Sunnyvale, US 56 455
Steele, David San Francisco, US 64 797

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