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United States of America Patent

SERIAL NO

14454665

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Abstract

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A method for plating electrodes includes contacting a substrate with an electrolyte, the substrate comprising a plurality of working electrodes, applying an electric potential to one or more working electrodes of the plurality of working electrodes, monitoring a separate current through each of the one or more working electrodes of the plurality of working electrodes, and in response to determining that a first current through a first electrode of the plurality of working electrodes has reached a predetermined value, interrupting the first current through the first working electrode.

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Patent Owner(s)

Patent OwnerAddress
GENERAL ATOMICS3550 GENERAL ATOMICS COURT SAN DIEGO CA 92121

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Wen Ontario, CA 5 43

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