METHOD OF MANUFACTURING A RETARDATION FILM
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United States of America Patent
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Issued Date -
Feb 5, 2015
app pub date -
Mar 11, 2014
filing date -
Aug 1, 2013
priority date (Note) -
Abandoned
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Abstract
The present disclosure relates to a method of manufacturing the retardation film. The method includes providing a microstructure substrate. The microstructure substrate has a plurality of protruding portions and a plurality of recessed portions alternatively arranged. The method further includes forming an optical alignment layer on the microstructure substrate. The method further includes applying a polarized ultraviolet (UV) to the optical alignment layer above the microstructure substrate. The polarized UV is applied in a diffusion angle from normal vector of the microstructure substrate such that the optical alignment layer forms a uniform alignment angle, and the diffusion angle is substantially 20°-60°.
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