Rotatable Frame For a Lithographic Apparatus
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United States of America Patent
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Issued Date -
Feb 5, 2015
app pub date -
Jan 30, 2013
filing date -
Apr 11, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
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