CRYSTAL FILM, METHOD FOR MANUFACTURING CRYSTAL FILM, VAPOR DEPOSITION APPARATUS AND MULTI-CHAMBER APPARATUS

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United States of America Patent

SERIAL NO

14335121

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Abstract

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To improve the single crystallinity of a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film. A crystal film includes a Zr film and a stacked film in which a ZrO2 film and a Y2O3 film formed on the Zr film are stacked, and has a peak half-value width when the stacked film is evaluated by X-ray diffraction being 0.05° to 2.0°.

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Patent Owner(s)

Patent OwnerAddress
YOUTEC CO LTD956-1 NISHI-HIRAI NAGAREYAMA-SHI CHIBA 270-0156

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HONDA, Yuuji Chiba, JP 53 491
KIJIMA, Takeshi Chiba, JP 167 1581

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