PEDESTAL BOTTOM CLEAN FOR IMPROVED FLUORINE UTILIZATION AND INTEGRATED SYMMETRIC FORELINE
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United States of America Patent
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Jan 29, 2015
app pub date -
Jul 25, 2013
filing date -
Jul 25, 2013
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Abstract
A technique and apparatus for cleaning the underside of a pedestal in a single- or multi-station semiconductor processing chamber or tool are provided. Also provided is an integrated vacuum foreline manifold having symmetric flow path lengths that may be used in multi-station semiconductor processing chamber or tool.
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