BAFFLE AND APPARATUS FOR TREATING SURFACE OF BAFFLE, AND SUBSTRATE TREATING APPARATUS
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United States of America Patent
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Issued Date -
Jan 22, 2015
app pub date -
Jul 19, 2013
filing date -
Jul 19, 2013
priority date (Note) -
Abandoned
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Abstract
The present invention relates to a substrate treating apparatus, and more particularly, to an apparatus treating a substrate using plasma. In an embodiment, a baffle is formed with holes distributing a process gas excited to a plasma state, and has a surface which is treated with a surface treating material comprising a silicon compound.
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