MTJ MEMORY CELL WITH PROTECTION SLEEVE AND METHOD FOR MAKING SAME
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United States of America Patent
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Sep 30, 2014
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Jun 22, 2012
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Abstract
Methods and structures are described to reduce metallic redeposition material in the memory cells, such as MTJ cells, during pillar etching. One embodiment of the present invention as applied to a memory cell comprises a top electrode layer, an upper magnetic layer, a barrier layer, a lower magnetic layer and a bottom electrode layer in a pillar formed on a landing pad; and a sleeve of dielectric material generally surrounding sidewalls of at least the barrier layer and the lower magnetic layer and partially surrounding the bottom electrode layer. The bottom electrode layer includes a ledge that extends under the sleeve of dielectric material and separates the sleeve of dielectric material from the landing pad under the bottom electrode layer.
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