WET PROCESSING APPARATUS AND PLATING APPARATUS
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United States of America Patent
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Issued Date -
Jan 15, 2015
app pub date -
Jul 8, 2014
filing date -
Jul 10, 2013
priority date (Note) -
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Abstract
A wet processing apparatus, such as a plating apparatus, and an etching apparatus, is disclosed. A wet processing apparatus includes a substrate-holder advancing mechanism configured to elevate a movable support to raise a substrate holder until the substrate holder is separated from a fixed support, move the movable support together with the substrate holder by a predetermined distance toward a holder takeout position, lower the movable support until the substrate holder is supported on the fixed support and the movable support is separated from the substrate holder, and move the movable support by the predetermined distance toward a holder put-in position.
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