TRANSPARENT SUBSTRATE MONITORING APPARATUS AND TRANSPARENT SUBSTRATE METHOD

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United States of America Patent

SERIAL NO

14491589

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Abstract

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Provided are a transparent substrate monitoring apparatus and a transparent substrate monitoring method. The transparent substrate monitoring apparatus includes a light emitting unit emitting light; a double slit disposed on a plane defined in a first direction and a second direction intersecting a propagation direction of incident light and includes a first slit and a second slit spaced apart from each other in the first direction to allow the light to pass therethrough; an optical detection unit measuring an intensity profile or position of an interference pattern formed on a screen plane; and a signal processing unit receiving a signal from the optical detection unit to calculate an optical phase difference or an optical path difference.

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Patent Owner(s)

Patent OwnerAddress
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE267 GAJEONG-RO YUSEONG-GU DAEJEON 34113 34113

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
EOM, Tae-Bong Daejeon, KR 4 14
JIN, Jong-Han Daejeon, KR 4 13
KANG, Chu-Shik Daejeon, KR 6 22
KIM, Jae-Wan Daejeon, KR 27 177
KIM, Jong-Ahn Daejeon, KR 9 27

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