RETARDATION PLATE MANUFACTURING METHOD

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United States of America Patent

SERIAL NO

14492076

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Abstract

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A retardation plate manufacturing method for manufacturing a retardation plate that has an orientation pattern in which is formed a plurality of regions having optical axes oriented in different directions from each other, the retardation plate manufacturing method comprising arranging an unoriented light orientation layer that is to be oriented by light on a first surface of a substrate; preparing a retardation mask including an orientation pattern in which is formed a plurality of regions that have a quarter wavelength retardation plate retardation function and correspond to the plurality of regions in the orientation pattern of the retardation plate; and orienting the light orientation layer by irradiating the retardation mask with elliptically polarized light and irradiating the light orientation layer with polarized light emitted form the retardation mask.

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Patent Owner(s)

Patent OwnerAddress
ARISAWA MFG CO LTD5-5 MINAMI-HONCHO 1-CHOME JOETSU-SHI NIIGATA 943-8610

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAKUBARI, Yuichi Niigata, JP 8 29
WATABE, Kenichi Niigata, JP 14 74

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