METHOD FOR THE COATING OF A SUBSTRATE
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United States of America Patent
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app pub date -
Sep 26, 2014
filing date -
Sep 2, 2008
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Abstract
Method for the coating of a substrate (S) in a process chamber (3), in which a gas atmosphere is set up and maintained in the process chamber (3) and an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22) are provided in the process chamber (3). The cylindrical vaporization cathode (2, 21, 22) includes the target material (200, 201, 202) and the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) is transferred into a vapor phase by means of an electrical source of energy (7, 71, 72). A magnetic field source (8, 81, 82) generates a magnetic field is provided in the process chamber (3) in such a way that, a magnetic field strength of the magnetic field can be changed in a preset region of the cylindrical vaporization cathode (2, 21, 22), characterized in that a cylindrical sputtering cathode (2, 21) and a cylindrical arc cathode (2, 22) are simultaneously provided in the process chamber (3) and in that the substrate (S) is coated with an arc vaporization process and/or with a cathode sputtering process.
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