Chemical Vapour Deposition of PTSI from Organometallic Complexes of PT
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United States of America Patent
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Issued Date -
Jan 1, 2015
app pub date -
Jan 16, 2013
filing date -
Jan 17, 2012
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Abandoned
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Abstract
The present invention relates to the use, as a precursor for the chemical vapour deposition of PtSi at the surface of a support, of at least one organometallic complex of Pt comprising at least:—a ligand having a cyclic structure that comprises at least two non-adjacent C═C double bonds, or two ligands having a cyclic structure that each comprise a C═C double bond; and—a ligand chosen from *O—Si(R)3 and *N—(Si(R)3)2, with: the R units being chosen, independently of one another, from (C1-C4)alkoxy groups; the R′ units being chosen, independently of one another, from (C1-C4)alkyl and (C3-C4)cycloalkyl groups; and * representing the coordination of the ligand to the platinum.
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