MASK

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United States of America Patent

APP PUB NO 20150002803A1
SERIAL NO

14096964

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A mask for sealant curing includes an opaque region, a transparent region, and a partially transparent region. The transparent region is associated with a sealant region, which is to be cured, and the partially transparent region is disposed between the opaque region and the transparent region. RaysThe partially transparent region includes a pattern that has a regular shape or an irregular shape.

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Patent Owner(s)

Patent OwnerAddress
TIANMA MICRO-ELECTRONICS CO LTDSHENZHEN
SHANGHAI AVIC OPTOELECTRONICS CO LTDNO 3388 HUANING ROAD MINHANG DISTRICT SHANGHAI

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
QIN, Dandan Shanghai, CN 28 61
XIA, Zhiqiang Shanghai, CN 71 258

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