MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLES
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United States of America Patent
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app pub date -
Apr 14, 2014
filing date -
Jul 27, 2007
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Abandoned
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Abstract
A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
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