LOW SURFACE ROUGHNESS POLISHING PAD
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United States of America Patent
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Issued Date -
Dec 18, 2014
app pub date -
Jun 13, 2013
filing date -
Jun 13, 2013
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Abstract
The invention provides a polishing pad comprising a polishing pad body comprising a polishing surface, wherein the polishing body comprises pores, and wherein the polishing surface has a surface roughness of about 0.1 μm to about 10 μm.
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