PATTERNABLE MATERIALS AND METHODS OF USE
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United States of America Patent
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Issued Date -
Dec 18, 2014
app pub date -
Jun 12, 2013
filing date -
Jun 12, 2013
priority date (Note) -
Abandoned
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Abstract
A patternable material can be prepared with an elastomeric relief image-forming layer. The patternable material has a relief image-forming elastomeric layer and also has a layer disposed on the entire surface of this elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire surface.
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