Performing Atomic Layer Deposition on Large Substrate Using Scanning Reactors
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United States of America Patent
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Issued Date -
Dec 18, 2014
app pub date -
Jun 6, 2014
filing date -
Aug 11, 2009
priority date (Note) -
Abandoned
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Abstract
Embodiments relate to a deposition device for depositing one or more layers of material on a substrate using scanning modules that move across the substrate in a chamber filled with reactant precursor. The substrate remains stationary during the process of depositing the one or more layers of material. A chamber enclosing the substrate is filled with reactant precursor to expose the substrate to the reactant precursor. As the scanning modules move across the substrate, the scanning modules remove the reactant precursor in their path and/or revert the reactant precursor to an inactive state. The scanning modules also inject source precursor onto the substrate as the scanning modules move across the substrate.
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