POLYAMIC ACID SOLUTION

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United States of America Patent

APP PUB NO 20140364564A1
SERIAL NO

14369084

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Abstract

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The present invention relates to a polyamic acid solution and a display device, and more specifically, to a polyamic acid solution which can be used for a base layer or a protective layer of a display device, and a display device including a film formed by the imidization of the polyamic acid solution. The polyamic acid solution has excellent thermal characteristics such as a low coefficient of thermal expansion and a high thermal decomposition temperature, and can thus be applied to a base layer or a protective layer of a display device.

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Patent Owner(s)

Patent OwnerAddress
KOLON INDUSTRIES INC(MAGOK-DONG) 110 MAGOKDONG-RO GANGSEO-GU SEOUL 07793

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hong, Ki Il Yongin-si, KR 5 17
Min, Woong Ki Yongin-si, KR 24 333

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