SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE
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United States of America Patent
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Issued Date -
Dec 11, 2014
app pub date -
Jun 10, 2013
filing date -
Jun 10, 2013
priority date (Note) -
Abandoned
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Abstract
A substrate treating apparatus including: a chamber capable of accommodating a substrate; a treating part which conducts a predetermined treatment associated with forming a coating film containing a metal to the substrate accommodated in the chamber; and a detection part which detects a concentration of a predetermined gas containing a chalcogen element within a gas inside the chamber.
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