ZnO-BASED SPUTTERING TARGET AND PHOTOVOLTAIC CELL HAVING PASSIVATION LAYER DEPOSITED USING THE SAME

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United States of America Patent

APP PUB NO 20140352786A1
SERIAL NO

14287673

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Abstract

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A zinc oxide (ZnO)-based sputtering target which is available for DC sputtering and a photovoltaic cell having a passivation layer deposited using the same. The ZnO-based sputtering target includes a sintered body made of ZnO, the ZnO being doped with 10 to 60% by weight gallium oxide, and a backing plate bonded to the rear surface of the sintered body to support the sintered body. The passivation layer can prevent a change in the composition of the light-absorbing layer from lowering an efficiency.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG CORNING ADVANCED GLASS LLCTANGJEONG-MYEON ASAN-SI CHUNGCHEONGNAM-DO 336-725

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Go, Hwangyong Chungcheongnam-do, KR 1 2
Lee, YoonGyu Chungcheongnam-do, KR 6 42
Park, Juok Chungcheongnam-do, KR 3 19
Seo, Soo Young Chungcheongnam-do, KR 1 2

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