FORMATION OF A SUPRA-MONOLAYER NANOPATTERN AND ITS USES

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United States of America Patent

APP PUB NO 20140349889A1
SERIAL NO

14364589

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Abstract

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The present disclosure discloses a method to prepare a supra-monolayer nanopattern and its uses.

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Patent Owner(s)

Patent OwnerAddress
WAYNE STATE UNIVERSITY5057 WOODWARD DETROIT MI 48202

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jahanian, Pedram Hamtramck, US 1 0
Mao, Guangzhao Northville, US 6 9
Sobczynski, Daniel J Saint Clair Shores, US 1 0
Wang, Sunxi Detroit, US 1 0
Xhahysa, Juxhin Macomb, US 1 0

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