PHOTOSENSITIVE MATERIAL, HOLOGRAPHIC RECORDING MEDIUM AND HOLOGRAPHIC RECORDING METHOD
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United States of America Patent
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Issued Date -
Nov 27, 2014
app pub date -
Nov 12, 2012
filing date -
Nov 14, 2011
priority date (Note) -
Abandoned
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Abstract
A photosensitive material includes: a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator, wherein the polymer matrix has stable nitroxy radical at side chain thereof, wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25.
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