Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species

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United States of America Patent

PATENT NO 10804098
APP PUB NO 20140346650A1
SERIAL NO

14457058

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Abstract

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The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).

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ASM IP HOLDING B VALMERE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mohith, Verghese Phoenix, US 2 1471
Raisanen, Petri Phoenix, US 59 17790
Sung-hoon, Jung Phoenix, US 2 1471

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