SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY
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United States of America Patent
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Issued Date -
Nov 27, 2014
app pub date -
Dec 18, 2012
filing date -
Jan 13, 2012
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Abstract
A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.
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