Apparatus for Monitoring a Lithographic Patterning Device
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United States of America Patent
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Issued Date -
Nov 20, 2014
app pub date -
Aug 21, 2012
filing date -
Sep 16, 2011
priority date (Note) -
Abandoned
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Abstract
A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41′) after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.
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