Electron beam plasma source with reduced metal contamination
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United States of America Patent
Stats
-
Aug 1, 2017
Issued Date -
N/A
app pub date -
Jun 7, 2013
filing date -
May 16, 2013
priority date (Note) -
In Force
status (Latency Note)
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Abstract
In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.
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International Classification(s)
- 2013 Application Filing Year
- H01J Class
- 2042 Applications Filed
- 1790 Patents Issued To-Date
- 87.66 % Issued To-Date
Cited Art Landscape
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- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 8 Age
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