DETECTION APPARATUS AND METHOD OF CHEMICAL MECHANICAL POLISHING CONDITIONER

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20140335761A1
SERIAL NO

14253670

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a detection apparatus of chemical mechanical polishing conditioner, comprising: a working platform with a working plane; a placement base disposed on the working plane of the working platform, for carrying a chemical mechanical polishing conditioner; an image capture device forming one or a plurality of captured images on different regions of the chemical mechanical polishing conditioner; a display device; an image recognition module, wherein the captured images are performed a color matching by the image recognition module to determine one or a plurality of risk diamonds on the chemical mechanical polishing conditioner, and the coordinate location of the risk diamonds are outputted into the display device; and a mobile platform for moving the risk diamonds to specified locations. A detection method of the above mentioned detection apparatus is also disclosed.

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Patent Owner(s)

Patent OwnerAddress
KINIK COMPANYNO 10 YENPING SOUTH RD TAIPEI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Jen Feng New Taipei, TW 4 26
CHIU, Chia-Feng New Taipei, TW 23 165
CHOU, Jui-Lin Hualien County, TW 30 191
LIAO, Wen-Jen New Taipei, TW 16 166
LIN, Yi-Ting New Taipei, TW 115 917
WANG, Chia Chun New Taipei, TW 7 48

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