ANISOTROPIC OPTICAL MATERIAL
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Nov 6, 2014
app pub date -
Jun 12, 2014
filing date -
Dec 10, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method for producing a material with anisotropic optical properties, the method comprising: fabricating a patterned mask with alternating opaque and transparent regions; assembling a stack containing one or more layers of photosensitive material; and exposing the photosensitive material through the mask to photographically reproduce the pattern or its inverse. This photographic copying process yields a reproduction which is inherently well-registered to the mask's pattern, and the resulting registered patterns allow transmission in some directions whilst blocking transmission in other directions.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully