APPARATUS FOR GENERATING PLASMA USING ELECTROMAGNETIC FIELD APPLICATOR AND APPARATUS FOR TREATING SUBSTRATE COMPRISING THE SAME
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United States of America Patent
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Issued Date -
Oct 30, 2014
app pub date -
Jul 19, 2013
filing date -
Apr 25, 2013
priority date (Note) -
Abandoned
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Abstract
A plasma generating apparatus is provided which includes an RF power which provides an RF signal; a plasma chamber which generates a plasma using the RF signal; a plurality of isolation loops which are formed along a circumference of the plasma chamber; and a plurality of electromagnetic applicators which are respectively coupled with the isolation loops and applies an electromagnetic field to the plasma chamber in response to the RF signal, wherein impedance values of the electromagnetic applicators increase according to an increase in a distance from an input terminal.
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