DRY ETCHING AGENT

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United States of America Patent

APP PUB NO 20140302683A1
SERIAL NO

14232054

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention is directed to providing a dry etching agent having little effect on the global environment but having the required performance. Provided is a dry etching agent containing, each at a specific vol %: (A) a fluorine-containing unsaturated hydrocarbon represented by the formula CaFbHc (in the formula, a, b and c are each positive integers and satisfy the correlations of 2≦a≦5, cb+c and b≦a+c, excluding the case where a=3, b=4 or c=2); (B) at least one kind of gas selected from the group consisting of O2, O3, CO, CO2, COCl2, COF2, F2, NF3, Cl2, Br2, I2, and YFn (where Y is Cl, Br or I and n is an integer of 1 to 5); and (C) at least one kind of gas selected from the group consisting of N2, He, Ar, Ne, Xe, and Kr.

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Patent Owner(s)

Patent OwnerAddress
CENTRAL GLASS COMPANY LIMITED5253 OAZA OKIUBE UBE-SHI YAMAGUCHI 7550001 ?7550001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hibino, Yasuo Shiki-shi, JP 32 563
Kikuchi, Akiou Ube-shi, JP 29 122
Mori, Isamu Ube-shi, JP 29 224
Okamoto, Satoru Fujimino-shi, JP 175 2019
Umezaki, Tomonori Nagoya-shi, JP 17 107

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  • 15 Citation Count
  • C09K Class
  • 71.41 % this patent is cited more than
  • 11 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges7239598351812412321201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0255075100125150175200225250275300325350375400425

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