HIGH-DENSITY METALLIC SPUTTERING TARGETS

United States of America Patent

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app pub date
May 5, 2014
filing date
Jan 16, 2007

priority date (Note)
Abandoned

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Abstract

The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.

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Patent Owner	Address
H C STARCK INC	45 INDUSTRIAL PLACE NEWTON MA 02461

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Kumar, Prabhat	Framingham, US	94	1335
Miller, Steven A	Canton, US	86	1526
Rozak, Gary	Akron, US	16	231
Wood, Charles	Coldwater, US	31	291
Wu, Rong-Chein Richard	Chelmsford, US	17	223
Zeman, Glen	Coldwater, US	2	26

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HIGH-DENSITY METALLIC SPUTTERING TARGETS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14269836

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14269836

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