BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS
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United States of America Patent
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Issued Date -
Oct 2, 2014
app pub date -
Mar 28, 2013
filing date -
Mar 28, 2013
priority date (Note) -
Abandoned
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Abstract
The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.
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