PHOTOSENSITIVE RESIN COMPOSITION

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United States of America Patent

APP PUB NO 20140295148A1
SERIAL NO

14225094

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A photosensitive resin composition includes a carboxyl group-containing photosensitive resin, a photopolymerization initiator, a compound having an ethylenic unsaturated group, a non-reactive diluent, and an epoxy compound. The photopolymerization initiator includes an oxime ester compound and an aminocarbonyl compound having a tertiary amino group.

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Patent Owner(s)

Patent OwnerAddress
TAMURA CORPORATION1-19-43 HIGASHI-OIZUMI NERIMA-KU TOKYO 1788511

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Horisawa, Kazuhiro Iruma-shi, JP 1 1
Kakiuchi, Naoya Iruma-shi, JP 3 14
Maekawa, Koji Iruma-shi, JP 71 468
Takebayashi, Yoshiki Iruma-shi, JP 2 2

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