Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method
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United States of America Patent
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Issued Date -
Oct 2, 2014
app pub date -
Jun 16, 2014
filing date -
Aug 18, 2008
priority date (Note) -
Abandoned
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Abstract
A projection system is provided that includes a sensor system that measures at least one parameter that relates to the physical deformation of a frame that supports the optical elements within the projection system, and a control system that, based on the measurements from the sensor system, determines an expected deviation of the position of the beam of radiation projected by the projection system that is caused by the physical deformation of the frame.
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