METHOD FOR CLEANING COMPONENTS OF NITRIDE SEMICONDUCTOR MANUFACTURING APPARATUS AND DEVICE FOR CLEANING COMPONENTS OF NITRIDE SEMICONDUCTOR MANUFACTURING APPARATUS
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United States of America Patent
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Issued Date -
Oct 2, 2014
app pub date -
Sep 25, 2012
filing date -
Sep 27, 2011
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Abandoned
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Abstract
A method for cleaning a component of a nitride semiconductor manufacturing apparatus to which has adhered deposits containing nitride semiconductor comprises a step for chemically treating the component of the nitride semiconductor manufacturing apparatus with a cleaning gas containing a chlorine-based gas, and a step for removing the deposits from the component of the nitride semiconductor manufacturing apparatus by spraying with a sublimable solid substance.
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