Deposition Method and Deposition Apparatus

United States of America Patent

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Issued Date
Sep 25, 2014
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Apr 26, 2013
filing date
May 16, 2012

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Abandoned

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Abstract

[Object] To provide a deposition method and a deposition apparatus, which are capable of cleaning a surface of a silicon substrate and causing a single crystal film having excellent crystallinity to grow on the surface.

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Patent Owner	Address
ULVAC INC	KANAGAWA JAPAN KANAGAWA

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Takahashi, Seiichi	Shizuoka, JP	60	766

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Deposition Method and Deposition Apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14347537

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14347537

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